RF-PECVD법에 의해 증착된 DLC 박막의 결합 특성
Bonding structure of the DLC films deposited by RF-PECVD
0
조회
0
다운로드
1
인용
0
참고문헌
초록
GaN GaN . Ar ! " #$ %&' ()*+, " -./ 01, 10 Pa ! %&' 2 smooth () 34 GaN ,-567 89 :, ;< 200 mJ/pulse %&' 2 #$ %&' 1 => 0- %? " @A B ?CD - EF . photoluminescence spectraGH GaN 2 I 2.8 eV J band gap KL;- MN56 :, 200 mJ/pulse 10 Pa ?O P2 KLQR EF .
Abstract
Amorphous GaN film was deposited using a laser ablation of the highly densified GaN target. Through the surface morphological and compositional analysis of films deposited under various laser energies and Ar gas pressures, the film deposited under the pressure of 10 Pa were found to be amorphous GaN with the smooth surface. In particular, the film at 200 mJ/pulse showed the enhanced crystallinity and stoichiometric composition, compared with those of the films at relatively lower laser energy. The strong band-gap emission at 2.8 eV was observed from amorphous GaN film in the room temperature photoluminescence spectra, showing the highest efficiency in the film at 200 mJ/pulse under 10 Pa.
참고문헌 (27)
- J.W. Zou, "The properties of a-C H films deposited by plasma decomposition of C2H2", pp.487~ (1990)
- R. Kalish, "Effects of heavy ion irradiation on amorphous hydrogenated", pp.2 4492~ (1987)
- J. Wagner, "Hard amorphous carbon studied by ellipsometry and photoluminescence", pp.2044~ (1986)
- H. Nakaue, "Applications of diamond-like carbon films to electronic components", pp.240~ (1992)
- J.C. Angus, "Dense diamondlike hydrocarbons as random covalent networks", pp.1778~ (1988)
- V. Kh. Kudoyarova, "Study of diamond-like carbon films for protective coatings", 100, pp.192~ (1998)
- Jerome J. Cuomo, "Sputter deposition of dense diamond-like carbon films at low temperature", pp.466~ (1991)
- F. Davanloo, "Amorphic diamond films produced by a laser plasma source", pp.2081~ (1990)
- P. Reinke, "Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma", pp.434~ (1992)
- J.W. Zou, "The deposition and study of hard carbon films", pp.3914~ (1989)
- K.K. Hirakuri, "Rf plasma properties of flat electrodes with multi-input terminals", 46, pp.57~ (1995)
- S.-J. Cho, "Evaluation of elastic properties of DLC films using substrate etching techniques", 35, pp.813~ (1998)
- A. Grill, "Inhomogeneous carbon bonding in hydrogenated amorphous carbon films", pp.2874~ (1987)
- S.S. Choi, "Deposition of diamondlike carbon films by plasma enhanced chemical vapour deposition", pp.133~ (1997)
- W.-J. Wu, "Thermal stability of diamond-like carbon films with added silicon", 111, pp.134~ (1999)
- B.K. Kim, "Comparison of a-C H films deposited from methane-argon and acetylene-argon mixtures by electron cyclotron resonance-chemical vapor deposition discharges", 9, pp.37~ (2000)
- Z. Jiang, "Nanotribological characterization of hydrogenated carbon films by scanning probe microscopy", 258, pp.75~ (1995)
- V. Palshin, "Characterization of ion-beam-deposited diamond-like carbon films", 270, pp.165~ (1995)
- G.J. Vandendentop, "Formation of hydrogenated amorphous carbon films of controlled hardness from a methane plasma", pp.3200~ (1990)
- A. Tabata, "prepared by the plasma CVD method", pp.316~ (1990)
- T. Sato, "Diamond-like carbon films prepared by pulsed-laser evaporation", s. furu, pp.355~ (1988)
- H. Tsai, "Critical review characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recording", pp.3287~ (1987)
- L.A. Farrow, "Raman scattering and hydrogen-content analysis of amorphous hydrogenated carbon films irradiated with 200-KeV C+ ions", pp.10132~ (1990)
- R.O. Dillon, "Use of Raman scattering to investigate disorder and crystallite formation in as-deposited and annealed carbon films", pp.3482~ (1984)
- D. beeman, "Modeling studies of amorphous carbon", pp.870~ (1984)
- Sunil Kumar, "Unhydrogenated diamond-like carbon films prepared by dc plasma chemical vapor deposition at room temperature"
- S.F. Yoon, "Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition", 9, pp.2024~ (2000)