Sol-gel 법에 의한 초발수 SiO2 박막의 제조 및 특성
Fabrication and properties of superhydrophobic SiO2 thin film by sol-gel method
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초록
초발수 SiO2 박막을 sol-gel법에 의해 유리 기판 위에 성공적으로 제조하였다. 높은 표면 조도를 갖는 SiO2 박막 을 제조하기 위하여 tetraethoxysilane(TEOS) 용액에 SiO2 나노 입자들을 첨가하였다. SiO2 입자를 첨가하지 않은 용액을 이 용하여 제조한 코팅막은 RMS roughness가 1.27 nm의 매우 평평한 표면 구조를 나타낸 반면, SiO2 나노 입자들을 1.0, 2.0, 3.0 wt% 첨가한 용액을 이용하여 제조한 SiO2 박막의 RMS roughness는 44.10 nm, 69.58 nm, 80.66 nm로 측정되었다. 제조된 SiO2 박막의 표면을 소수성 표면으로 바꾸기 위하여 FAS 용액을 이용하여 발수 처리를 하였다. FAS 처리 이후 거친 표면 구조를 갖는 SiO2 박막의 표면은 친수성에서 소수성으로 바뀌었고 특히, 80.66 nm의 RMS roughness를 갖는 박막은 163 o의 물 접촉각을 갖는 초발수 표면을 나타내었다.
Abstract
Superhydrophobic SiO2 thin films were successfully fabricated on a glass substrate by sol-gel method. To fabricate SiO2 thin film with a high roughness, SiO2 nano particles were added into tetraethoxysilane (TEOS) solution. The prepared SiO2 thin film without an addition of SiO2 nano particles showed a very flat surface with ca. 1.27 nm of root mean square (RMS) roughness. Otherwise, the SiO2 thin films fabricated by using coating solutions added SiO2 nano particles of 1.0, 2.0 and 3.0 wt% showed a RMS roughness of ca. 44.10 nm, ca. 69.58 nm, ca. 80.66 nm, respectively. To modify the surfaces of SiO2 thin films to hydrophobic surface, a hydrophobic treatment was carried out using a fluoroalkyltrimethoxysilane (FAS). The SiO2 thin films with a high rough surface were changed from hydrophilic to hydrophobic surface after the FAS treatment. Especially, the prepared SiO2 thin film with a RMS roughness of 80.66 nm showed a water contact angle of 163 o .
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