TiO₂-xNx thin films synthesized by liquid spray mist chemical vapor deposition (LSMCVD) and their photoelectrical properties
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TiOx-₂Nx electrodes were prepared by liquid sprayed mist chemical vapor deposition (LSMCVD) at 1 atmospheric pressure. The liquid source was made by dissolving the starting materials in 2-methoxyethanol. Through controlling the substrate temperature and deposition time, TiO₂-xNx films could successfully be fabricated. The photoelectrochemical response in an electrolyte for nitrogen-doped titanium dioxide, TiOx-₂Nx, was examined. From the optical absorption spectra of TiO₂-xNx and TiO₂ films, the TiO₂-xNx films noticeably absorb the light at less than 550 nm. With light irradiation, the photoelectrochemical response shows significant improvement for the nitrogen-doped film electrode, compared to the situation for undoped TiO₂.
Abstract
TiOx-₂Nx electrodes were prepared by liquid sprayed mist chemical vapor deposition (LSMCVD) at 1 atmospheric pressure. The liquid source was made by dissolving the starting materials in 2-methoxyethanol. Through controlling the substrate temperature and deposition time, TiO₂-xNx films could successfully be fabricated. The photoelectrochemical response in an electrolyte for nitrogen-doped titanium dioxide, TiOx-₂Nx, was examined. From the optical absorption spectra of TiO₂-xNx and TiO₂ films, the TiO₂-xNx films noticeably absorb the light at less than 550 nm. With light irradiation, the photoelectrochemical response shows significant improvement for the nitrogen-doped film electrode, compared to the situation for undoped TiO₂.
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