고온 (300~1000 ℃)에서 티타늄 금속시편의 표면 산화거동

Abstract

For the investigation of the oxidation behavior for titanium metal at various temperatures, titanium specimens were heated for 2 hours in the range of 300~1000 ℃, individually. And then X-ray diffraction(XRD), scanning electron microscopy (SEM)/energy dispersive spectroscopy (EDS) and attenuated total reflection-Fourier transform infrared (ATR-FTIR) spectroscopic analyses were carried out. At 300 ℃, infrared absorption bands on the surface of the titanium specimen were shown in a spectrum by the oxygen uptake of titanium metal(hexagonal). At increased temperature, not only infrared absorption bands but also X-ray diffraction peaks for the titanium oxide were grown and shifted to low wave number (㎝<SUP>−1</SUP>) and angle(°) due to the more oxygen diffusion into titanium metal. At 700 ℃, Ti₃O (hexagonal phase) was identified by X-ray diffractometer. TiO₂ (rutile, tetragonal phase) layer was produced on the surface of the specimen below 1 ㎛ in thickness at 600 ℃, and grown about 2 ㎛ at 700 ℃ and with 110 ㎛ in thickness at 1000 ℃. Above 900 ℃, (110) plane of the crystal on the surface of rutile-TiO₂ layer was grown.