고분자형 산 증식제에 기초한 새로운 포토레지스트의 연구

Abstract

Acid amplifying copolymers are synthesized by the copolymerization of tert-butyl methacrylate(tBMA)with acid-sensitive functional group and 4-hydroxy-4p-styrenesufonyloxyisopropylidene dicyclohexane(HSI) or 4-p-styrenesulfonyloxy-4'-tosyloxyisopropylidenedicyclohexane(STI) with acid-amplifying group as novel polymeric acidamplifying photoresists. Poly(HSI-co-tBMA) film and Poly(STI-co-tBMA) film as acid amplifying photoresists showreasonable thermal stability in the absence of an acid species. Poly(STI-co-tBMA) film exhibits 2X higher photo-sensitivity, whereas Poly(HSI-co-tBMA) film show 2X lower photosensitivity compared with ptBMA homopolymer. Theattachment of acid-amplifying units to polymer backbones could provide a novel way to enhance the photosensitivity ofacid-sensitive polymers depending on the structure of acid-amplifying units.