이온빔 조사로 제조된 HfO2 배향막에서의 프리틸트각 특성에 관한 연구
A Study of the pretilt angle characteristics in HfO2 orientation film prepared by ion beam irradiation
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초록
Ion-beam irradiation(IB) on HfO2 surface induced high-performance liquidcrystal(LC) driving at a 1-V threshold with vertical alignment of liquid crystals(LC). The high-k materials Atomic layer deposition was used to obtain LC orientation on ultra thin and high-quality films of HfO2 layers. To analyze surface morphological transition of HfO2 which can act as physic alignment effect of LC, atomic force micro scopy images are employed with various IB intensities. The contact angle was measured to elucidate the mechanism of vertical alignment of LC on HfO2 with IB irradiation. Contact angle measurements show the surface energy changes via IB intensity increasing.
Abstract
Ion-beam irradiation(IB) on HfO2 surface induced high-performance liquidcrystal(LC) driving at a 1-V threshold with vertical alignment of liquid crystals(LC). The high-k materials Atomic layer deposition was used to obtain LC orientation on ultra thin and high-quality films of HfO2 layers. To analyze surface morphological transition of HfO2 which can act as physic alignment effect of LC, atomic force micro scopy images are employed with various IB intensities. The contact angle was measured to elucidate the mechanism of vertical alignment of LC on HfO2 with IB irradiation. Contact angle measurements show the surface energy changes via IB intensity increasing.
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