Preparation and electric characteristics of MgO films deposited by plasma-enhanced chemical vapor deposition
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In a plasma display panel (PDP) as one very successful technology, a MgO thin film is used to protect the dielectric layer of an AC PDP due to its large secondary electron emission coefficient resulting in a lower firing voltage. In this study, we deposited an MgO film using a plasma-enhanced chemical vapor deposition method and identified the characteristics of the MgO film by observing its preferred orientation and surface shape in terms of substrate type and deposition variables. MgO films with good morphology and a (200) preferred orientation were obtained on Si(100), Pt/Ti/SiO2/Si(100), and glass substrates when the deposition temperature is approximately 270 . Pt/MgO/ITO/glass and Pt/MgO/ITO/PET capacitors were fabricated and their electric properties were measured for a low temperature application such as in a flexible display.
Abstract
In a plasma display panel (PDP) as one very successful technology, a MgO thin film is used to protect the dielectric layer of an AC PDP due to its large secondary electron emission coefficient resulting in a lower firing voltage. In this study, we deposited an MgO film using a plasma-enhanced chemical vapor deposition method and identified the characteristics of the MgO film by observing its preferred orientation and surface shape in terms of substrate type and deposition variables. MgO films with good morphology and a (200) preferred orientation were obtained on Si(100), Pt/Ti/SiO2/Si(100), and glass substrates when the deposition temperature is approximately 270 . Pt/MgO/ITO/glass and Pt/MgO/ITO/PET capacitors were fabricated and their electric properties were measured for a low temperature application such as in a flexible display.
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