Structural properties of limn2o4 thin films deposited by rf magnetron sputtering
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Lithium manganese oxide (LiMn2O4) cathode thin films were deposited on a Si substrate by radio frequency (RF) magnetronsputtering. The films were annealed within the range 400 to 700 oC for 2 h in O2. Structure and surface morphology of thefilms were characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). Elementalanalysis was conducted by energy dispersive spectroscopy (EDS). The degree of crystallization in the films increases withannealing temperature. A phase transformation from the amorphous to the crystalline phase is apparent at around 600 oC. Films annealed at 700 oC exhibit characteristic XRD peaks with a predominant (111) orientation representing cubic spinelstructure. The lattice parameter is 6.694 Å for the 700 oC annealed film. The grain size gradually increases with annealingtemperature, as evident from the SEM images.
Abstract
Lithium manganese oxide (LiMn2O4) cathode thin films were deposited on a Si substrate by radio frequency (RF) magnetronsputtering. The films were annealed within the range 400 to 700 oC for 2 h in O2. Structure and surface morphology of thefilms were characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). Elementalanalysis was conducted by energy dispersive spectroscopy (EDS). The degree of crystallization in the films increases withannealing temperature. A phase transformation from the amorphous to the crystalline phase is apparent at around 600 oC. Films annealed at 700 oC exhibit characteristic XRD peaks with a predominant (111) orientation representing cubic spinelstructure. The lattice parameter is 6.694 Å for the 700 oC annealed film. The grain size gradually increases with annealingtemperature, as evident from the SEM images.
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