Effect of self-assembled monolayer and aluminum oxide ALD film on a PMMA substrate
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The antireflective (AR) coated poly methyl methacrylate (PMMA) substrate was deposited by atomic layer deposition (ALD)on a self-assembled monolayer (SAM) to improve hydrophobicity and mechano-chemical properties of organic thin films. Thewater contact angles (WCA) were tested to characterize the surface wettability of SAM octadecyltrichlorosilane (OTS) films. Results showed that a contact angle of 105.9 o was obtained for the SAM films with an annealing process, and the highest WCAof 120° was achieved for the films prepared by the SAM and ALD multi-process. The surface morphology of the SAM filmswith different assembly times and varying number of ALD cycles was obtained by atomic force microscopy (AFM). Themaximum light transmittance for the SAM films on the PMMA substrate reached 99.9% at a wavelength of 450 nm. It wasfound that the SAM surfaces were not affected at all by the ALD process.
Abstract
The antireflective (AR) coated poly methyl methacrylate (PMMA) substrate was deposited by atomic layer deposition (ALD)on a self-assembled monolayer (SAM) to improve hydrophobicity and mechano-chemical properties of organic thin films. Thewater contact angles (WCA) were tested to characterize the surface wettability of SAM octadecyltrichlorosilane (OTS) films. Results showed that a contact angle of 105.9 o was obtained for the SAM films with an annealing process, and the highest WCAof 120° was achieved for the films prepared by the SAM and ALD multi-process. The surface morphology of the SAM filmswith different assembly times and varying number of ALD cycles was obtained by atomic force microscopy (AFM). Themaximum light transmittance for the SAM films on the PMMA substrate reached 99.9% at a wavelength of 450 nm. It wasfound that the SAM surfaces were not affected at all by the ALD process.
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