나노미터 MOSFET 파워 게이팅 구조의 노화 현상 분석
Analysis of Aging Phenomena in Nanomneter MOSFET Power Gating Structure
0
조회
0
다운로드
0
인용
0
참고문헌
키워드
초록
It has become ever harder to design reliable circuits with each nanometer technology node under normal operation conditions, a tran- sistor device can be affected by various aging effects resulting in performance degradation and eventually design failure. The reliability(aging) effect has traditionally been the area of process engineers. However, in the future, even the smallest of variations can slow downa transistor’s switching speed, and an aging device may not perform adequately at a very low voltage. Because of such dilemmas, thetransistor aging is emerging as a circuit designer’s problem. Therefore, in this paper, the impact of aging effects on the delay and power dissipation of digital circuits by using nanomneter MOSFET power gating structure has been analyzed.. Based on this analyzed aging models, a reliable digital circuits can be designed.
Abstract
It has become ever harder to design reliable circuits with each nanometer technology node under normal operation conditions, a tran- sistor device can be affected by various aging effects resulting in performance degradation and eventually design failure. The reliability(aging) effect has traditionally been the area of process engineers. However, in the future, even the smallest of variations can slow downa transistor’s switching speed, and an aging device may not perform adequately at a very low voltage. Because of such dilemmas, thetransistor aging is emerging as a circuit designer’s problem. Therefore, in this paper, the impact of aging effects on the delay and power dissipation of digital circuits by using nanomneter MOSFET power gating structure has been analyzed.. Based on this analyzed aging models, a reliable digital circuits can be designed.
참고문헌 (9)
- B. Paul, "Temporal Performance Degradation Under NBTI:Estimation And Design For Improved Reliability Of Nanoscale Circuits", 1, pp.1~6 (2006)
- "3-D, 22nm: New Technology Delivers An Unprecedented Combination of Performance and Power Efficiency" (2012)[URL]
- Mostafa, H, "NBTI and Process Variations Compensation Circuits Using Adaptive Body Bias", Semiconductor Manufacturing, IEEE Transac-tions on, 25(3), pp.460~ (2012)
- S. V. Kumar, "Adaptive techniques for overcoming performance degradation due to aging in CMOS circuits", Proc. IEEE ASP-DAC, pp.284~289 (2009)
- F. Arnaud, "32nm general purpose bulk CMOS technology for high performance applications at low voltage", IEEE IEDM’08, pp.1~4 (2008)
- S. Sahhaf, "A new TDDB reliability prediction methodology accounting for multiple SBD and wear out", IEEE Trans. On Electron Devices, 56(7), pp.1424~1432 (2009)
- S. Sahhaf, "A new TDDB reliability prediction methodology accounting for multiple SBD and wear out", IEEE Trans. On Electron Devices, 56(7), pp.1424~1432 (2009)
- M. Rajesh, "A Study Of Failure Mechanisms In CMOS And Bjt Ics And Their Effect On Device Reliability", 2nd International Conference on Reliability (2010)
- K. K. Kim, "Power gating for ultralow voltage nanometer ICs", Proc. IEEE Int Circuits and Systems (ISCAS) Symp, pp.1472~1475 (2010)
