다공성 니켈 나노 구조체를 이용한 3차원 그래핀의 합성
Synthesis of Three-Dimensional Graphene Using Porous Nickel Nanostructure
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초록
그래핀은 저차원 구조에서 기인하는 우수한 특성으로 인해 슈퍼커패시터의 전극소재로 응용이 가능한 소재이다. 본 연구에서는 2차원 구조인 그래핀의 비 표면적 향상을 위해 다공성 니켈 나노구조체 표면에 열 화학기상증착법과 마이크로웨이브 플라즈마 화학기상증착법을 이용하여 3차원의 그래핀을 합성하였다. 주사전자현미경, 라만 분광법, X-선 광전자 분광법을 통해 합성된 그래핀의 구조적, 화학적 특성을 분석한 결과, 3차원 구조의 우수한 결정성을 지니는 다중층 그래핀이 다양한 기판 위에 합성된 것을 확인할 수 있었다.
Abstract
Graphene has been a valuable candidate for use as electrodes for supercapacitors. In order to improve the surface area of graphene, three-dimensional graphene was synthesized on porous Ni nanostructure using thermal chemical vapor deposition and microwave plasma chemical vapor deposition. The structural and chemical characterization of synthesized graphene was performed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy. It was confirmed that three-dimensional and high-crystalline multilayer graphene onto various substrates was synthesized successfully.
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