Ramp Loading Scratch 방법을 이용한 상용 HDD Media와 ZnO박막소재의 Scratch 특성에 관한 연구
Study on Scratch Characteristics of HDD Media and ZnO Thin Films by Ramp Loading Scratch Method
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In this work, ramp loading scratch method was used to evaluate the scratch characteristics of HDD media and ZnO thin films. Commercially available HDD media and ZnO thin films grown on silicon(100) substrate by sol-gel method were used. As for the ZnO films, the effects of annealing temperature after the film deposition process were also investigated. A custom built scratch tester was used to scratch the specimen under a ramp loading condition. The scratch track formed by ramp loading was measured by optical microscope and Atomic Force Microscopy (AFM). The wear depth and width were used to assess the scratch characteristics of the HDD Media and ZnO thin films. The results showed that ZnO film annealed at 800oC had the best scratch resistance property. Also, the HDD media showed overall better scratch resistance than the ZnO films.
Abstract
In this work, ramp loading scratch method was used to evaluate the scratch characteristics of HDD media and ZnO thin films. Commercially available HDD media and ZnO thin films grown on silicon(100) substrate by sol-gel method were used. As for the ZnO films, the effects of annealing temperature after the film deposition process were also investigated. A custom built scratch tester was used to scratch the specimen under a ramp loading condition. The scratch track formed by ramp loading was measured by optical microscope and Atomic Force Microscopy (AFM). The wear depth and width were used to assess the scratch characteristics of the HDD Media and ZnO thin films. The results showed that ZnO film annealed at 800oC had the best scratch resistance property. Also, the HDD media showed overall better scratch resistance than the ZnO films.
참고문헌 (7)
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