O2 플라즈마 처리를 통한 Ag 나노구조체 필름의 면저항 저감
Suppressed Sheet Resistance of Ag Nanostructure Films by O2 Plasma Treatment
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초록
Ag나노와이어 도전성 잉크를 플렉서블한 투명 기판 위에 코팅 후 이러한 여분의 유기물을 O2 플라즈마를 이용하여 제거함으로써 Ag 나노와이어를 이용한 투명전극의 면저항과 광학적 특성을 최적화하였다. Ag 나노와이어 도전성 잉크를 코팅한 후 30초간 O2 플라즈마 처리를 하였을 때 면저항은 최대 27 % 정도 감소하였으며, 잔류 유기물의 제거를 통하여 그 광학적 특성도 향상됨을 알 수 있었다. 또한 O2 플라즈마 처리 시간이 30초 이상 증가할 경우 그 면저항이 오히려 감소함을 확인하였는데, 이는 과도한 O2 플라즈마로 인하여 Ag나노와이어의 degradation이 일어나는데 그 원인이 있음을 확인하였다.
Abstract
Sheet resistance reduction in the Ag nanowire (NW) coated films is accomplished with slight improvement of optical properties for the application of transparent conducting electrodes by using O2 plasma treatment. The sheet resistance was optimized after 30 seconds O2 plasma treatment, showing the 27 % of maximum decrease of sheet resistance. It is found that the O2 plasma treatment get rid of the residual organic materials at the junction of Ag NWs. However, the Ag NWs may be also snapped by the excessive O2 plasma treatment can showing the collapses of Ag NWs networks. Furthermore, the optical properties such as optical transmittance and haze were monotonically improved with the O2 plasma treatment time until 90 seconds.
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