유도 결합 플라즈마-스퍼터 승화법을 이용한 고분자 전해질 연료전지 분리판용 CrN 박막의 내식성연구
Anti-corrosion Properties of CrN Thin Films Deposited by Inductively Coupled Plasma Assisted Sputter Sublimation for PEMFC Bipolar Plates
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In this study, low-cost, high-speed deposition, excellent processability, high mechanical strength and electrical conductivity, chemical stability and corrosion resistance of stainless steel to meet the obsessive-compulsive (0.1 mm or less) were selected CrN thin film. new price reduction to sputter deposition causes - the possibility of sublimation source for inductively coupled plasma Cr rods were attempts by DC bias. 0.6 Pa Ar inductively coupled plasmas of 2.4 MHz, 500 W, keeping Cr Rod DC bias power 30 W (900 V, 0.02 A) is applied, N2 flow rate of 0.5, 1.0, 1.5 sccm by varying the characteristics of were analyzed. N2 flow rate increases, decreases and Cr2N, CrN was found to increase. In addition to corrosion resistance and contact resistance, corrosion resistance, electrical conductivity was evaluated. corrosion current density than N2 0 sccm was sure to rise in all, N2 1 sccm at 4.390 × 10−7 (at 0.6 V) A·cm−2, respectively. electrical conductivity process results when N2 1 sccm 28.8 mΩ/cm2 with the lowest value of the contact resistance was confirmed that came out. The OES (SQ-2000) and QMS (CPM-300) using a reactive deposition process to add N2 to maintain a uniform deposition rate was confirmed that.)
Abstract
In this study, low-cost, high-speed deposition, excellent processability, high mechanical strength and electrical conductivity, chemical stability and corrosion resistance of stainless steel to meet the obsessive-compulsive (0.1 mm or less) were selected CrN thin film. new price reduction to sputter deposition causes - the possibility of sublimation source for inductively coupled plasma Cr rods were attempts by DC bias. 0.6 Pa Ar inductively coupled plasmas of 2.4 MHz, 500 W, keeping Cr Rod DC bias power 30 W (900 V, 0.02 A) is applied, N2 flow rate of 0.5, 1.0, 1.5 sccm by varying the characteristics of were analyzed. N2 flow rate increases, decreases and Cr2N, CrN was found to increase. In addition to corrosion resistance and contact resistance, corrosion resistance, electrical conductivity was evaluated. corrosion current density than N2 0 sccm was sure to rise in all, N2 1 sccm at 4.390 × 10−7 (at 0.6 V) A·cm−2, respectively. electrical conductivity process results when N2 1 sccm 28.8 mΩ/cm2 with the lowest value of the contact resistance was confirmed that came out. The OES (SQ-2000) and QMS (CPM-300) using a reactive deposition process to add N2 to maintain a uniform deposition rate was confirmed that.)
참고문헌 (14)
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