산화 텅스텐 나노막대의 트라이볼로지 특성
Tribological Properties of Tungsten Oxide Nanorods
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Friction and wear behavior of tungsten oxide nanorods (TONs) was investigated using friction force microscopy(FFM) employing colloidal probes instead of conventional sharp tips. Vertically well-ordered TONs with 40 nm diameter, 130 nm length and 100 nm pitch width were synthesized on an anodic aluminium oxide substrate using two step electrochemical anodizing processes. The colloidal probe (diameter 20 μm) attached at the free end of tipless cantilever was oscillated(scanned) against a stationary surface of vertically aligned TONs with various scan speeds (1.2 μm/s, 3.0 μm/s and 6.0 μm/s) and sliding cycles (100, 200 and 400) under normal load of 800 nN. The friction force and wear depth decreased with the increase of the scan speed. Plastically deformed thin layers were formed and sparsely deposited on the worn nonorod surface. The lower wear rate of the TONs with the longer oscillating cycles was attributed to the decreased real contact pressure due to the increase of real contact area between the colloidal probe and the TONs.
Abstract
Friction and wear behavior of tungsten oxide nanorods (TONs) was investigated using friction force microscopy(FFM) employing colloidal probes instead of conventional sharp tips. Vertically well-ordered TONs with 40 nm diameter, 130 nm length and 100 nm pitch width were synthesized on an anodic aluminium oxide substrate using two step electrochemical anodizing processes. The colloidal probe (diameter 20 μm) attached at the free end of tipless cantilever was oscillated(scanned) against a stationary surface of vertically aligned TONs with various scan speeds (1.2 μm/s, 3.0 μm/s and 6.0 μm/s) and sliding cycles (100, 200 and 400) under normal load of 800 nN. The friction force and wear depth decreased with the increase of the scan speed. Plastically deformed thin layers were formed and sparsely deposited on the worn nonorod surface. The lower wear rate of the TONs with the longer oscillating cycles was attributed to the decreased real contact pressure due to the increase of real contact area between the colloidal probe and the TONs.
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