화학적 polishing 및 etching을 통한 RE : YAG (RE = Nd 3+ , Er 3+ , Yb 3+ ) 단결정의 표면 결함 분석
Analysis of surface defect in RE : YAG (RE = Nd 3+ , Er 3+ , Yb 3+ ) single crystal using chemical polishing and etching
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초록
Czochralski 법으로 성장한 RE : YAG (RE = Nd 3+ , Er 3+ , Yb 3+ ) 단결정의 표면 결함을 측정하는 chemical polishing 및 etching 조건에 대하여 조사하였다. 최적의 chemical polishing 조건은 시편을 수직 방향으로 고정하고 85 % H3PO4 용액에서 330 o C, 30분 동안 진행한 것이었다. 또한 최적의 chemical etching 조건은 85 % H3PO4 용액에서 260 o C, 1시간 동안 진행한 것이었고, (111) 면에 70~80 μm 크기의 삼각형 etch pit들이 관찰되었다. 결함 밀도 분석 결과, Nd(1 %) : YAG는1.9 × 10 3개/cm 2 , Er(7.3 %) : YAG는 4.3 × 10 2개/cm 2 , Yb(15 %) : YAG는 5.1 × 10 2개/cm 2로 측정되었다.
Abstract
The conditions for chemical polishing and etching technique were investigated to reveal surface defects in RE : YAG (RE = Nd3+, Er3+, Yb3+) single crystals grown by Czochralski method. The optimal condition for chemical polishing was in 85 % H3PO4 solution at 330oC for 30 minutes with a specimen fixed in the vertical direction. In addition, the optimal condition for chemical etching was in 85 % H3PO4 solution at 260oC for 1 hour, and 70~80 μm sized triangular etch pits were observed on (111) face. As a result of defect density analysis, 1.9 × 103/cm2 for Nd(1 %) : YAG, 4.3 × 102/cm2 for Er(7.3 %) : YAG, and 5.1 × 102/cm2 for Yb(15 %) : YAG were measured.
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