Experimental Investigation and Quantum Chemical Calculations of Some (Chlorophenyl Isoxazol-5-yl) Methanol Derivatives as Inhibitors for Corrosion of Mild Steel in 1 M HCl Solution
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In this study, two novel Schiff base compounds including (3-(4-Chlorophenyl isoxazole-5-yl) methanol and(3-(2,4 dichlorophenol isoxazole-5-yl) methanol as corrosion inhibitors for mild steel in 1 M hydrochloricacid solution were investigated by potentiodynamic polarization, electrochemical impedance spectroscopy(EIS), and density functional theory (DFT) computations. The results showed that the corrosion inhibitionefficiency (IE) is remarkably enhanced with the growing concentration of the Schiff base inhibitors. Theresults from Tafel polarization and EIS methods showed that IE decreases with gradual increments of temperature. This process can be attributed to the displacement of the adsorption/desorption balance and hence to thediminution of the level of a surface coating. Also, the adsorption of two inhibitors over mild steel followedthe Langmuir adsorption isotherm. Too, the results of the scanning electron microscope (SEM) images showedthat the Schiff base inhibitors form an excellent protective film over mild steel and verified the resultsby electrochemical techniques. Additionally, the results from the experimental and those from DFT computationsare in excellent accordance.
Abstract
In this study, two novel Schiff base compounds including (3-(4-Chlorophenyl isoxazole-5-yl) methanol and(3-(2,4 dichlorophenol isoxazole-5-yl) methanol as corrosion inhibitors for mild steel in 1 M hydrochloricacid solution were investigated by potentiodynamic polarization, electrochemical impedance spectroscopy(EIS), and density functional theory (DFT) computations. The results showed that the corrosion inhibitionefficiency (IE) is remarkably enhanced with the growing concentration of the Schiff base inhibitors. Theresults from Tafel polarization and EIS methods showed that IE decreases with gradual increments of temperature. This process can be attributed to the displacement of the adsorption/desorption balance and hence to thediminution of the level of a surface coating. Also, the adsorption of two inhibitors over mild steel followedthe Langmuir adsorption isotherm. Too, the results of the scanning electron microscope (SEM) images showedthat the Schiff base inhibitors form an excellent protective film over mild steel and verified the resultsby electrochemical techniques. Additionally, the results from the experimental and those from DFT computationsare in excellent accordance.
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