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Thermal stability of residual stresses and residual stress gradients in multilayerLPCVD polysilicon films
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관련 논문AI추천
Microstructure and Residual Stress of Metallic Thin Films According to Deposition ParametersByungjunPark, YoungmanKim한국표면공학회 · 한국표면공학회지2003 · 제36권 제1호Structural modifications of SiOx/DLC films by thermal annealingKeun Ho Auh, Koichi Niihara, Won Jae Yang청정에너지연구소 · Journal of Ceramic Processing Research2004 · 제5권 제3호Fabrication of low-stress silicon nitride fulm for application to biochemical sensor array손영수한국센서학회 · 센서학회지2005 · 제14권 제5호The effects of initial gas composition and pressure on the growth behavior of CVD SiC films최두진, Young-JinLee청정에너지연구소 · Journal of Ceramic Processing Research2002 · 제3권 제3호Interfacial Electrical/Dielectric Characterization in Low TemperaturePolycrystalline Si황진하한국마이크로전자및패키징학회 · 마이크로전자 및 패키징학회지2005 · 제12권 제1호Improvement of the surface roughness and the electrical resistivity of polycrystallineSi1-xGex films by two step deposition and Ar/H2 plasma treatment소명기, Kyoung-Hoon Er, Seoung-Ho Lee청정에너지연구소 · Journal of Ceramic Processing Research2005 · 제6권 제1호
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