무전해 Ni-TiO2 복합도금을 이용한 광분해 특성 연구
Photolytic Characteristics of Ni-TiO2 Composite Coating from Electroless Plating
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Many fundamental studies have been carried out regarding waste water and hazardous gas treatments technologies using the photolysis effect of TiO2. However, a permanent use of TiO2 particles immobilized using organic or organic-inorganic binders is impossible. In this study, Ni-TiO2 composite coating was produced by electroless plating to trap TiO2 particles in the Ni coating layer. The electroless plating was performed in the bath solutions with three different concentrations of TiO2 particles : 10 g/l, 20 g/l, and 40 g/l. The surface and photolytic characteristics of the coating layer was investigated by the use of SEM, a scratch tester, and an UV-Visible spectrophotometer. The results showed that the amounts of immobilized TiO2 particles and the photolytic rate of the coating increased with the initial content of TiO2 particles in the electroless bath. In addition, the photolytic rate of the Ni-TiO2 composite coating was remarkably promoted by etching process in 10% HCl solution.
Abstract
Many fundamental studies have been carried out regarding waste water and hazardous gas treatments technologies using the photolysis effect of TiO2. However, a permanent use of TiO2 particles immobilized using organic or organic-inorganic binders is impossible. In this study, Ni-TiO2 composite coating was produced by electroless plating to trap TiO2 particles in the Ni coating layer. The electroless plating was performed in the bath solutions with three different concentrations of TiO2 particles : 10 g/l, 20 g/l, and 40 g/l. The surface and photolytic characteristics of the coating layer was investigated by the use of SEM, a scratch tester, and an UV-Visible spectrophotometer. The results showed that the amounts of immobilized TiO2 particles and the photolytic rate of the coating increased with the initial content of TiO2 particles in the electroless bath. In addition, the photolytic rate of the Ni-TiO2 composite coating was remarkably promoted by etching process in 10% HCl solution.
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