Basic 암모노써멀 방법에 의한 벌크 GaN 단결정의 성장 및 특성
Growth and characterization of bulk GaN single crystals by basic ammonothermal method
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초록
Basic 암모노써멀 방법을 사용하여 벌크 GaN 단결정을 성장시켰다. 종자 결정은 Hydride vapor phase epitaxy법으로 성장한 c면의 GaN 템플릿을 사용하고 광화제는 sodium metal, amide, azide를 사용하였다. 결정 성장 온도는 500~ 600 o C, 성장 압력은 2~3 kabr에서 실시하였다. c 축의 결정 성장 속도는 운용 압력이 증가함에 따라 선형적으로 증가하였다. Cathodoluminescence로 측정한 평균 전위 밀도는 1 × 10 5 /cm 2였다. Double Crystals X-ray Diffraction로 측정한 (002)면의 반치폭은 Ga 면에 대해서는 약 270 arcsec, N 면에 대해서는 약 80 arcsec이었다.
Abstract
Bulk GaN crystals were grown by the basic ammonothermal method. The c-plane GaN templates grown by hydride vapor phase epitaxy were used as seed crystals and sodium metal, amide, and azide were added as a mineralizer. The growth conditions are at temperatures from 500~600 o C and pressures from 2~3 kbar. The growth rate for the c-axis was increased with increasing the operating pressure. Average dislocation density was measured 1 × 10 5 /cm 2 by the cathodoluminescence measurement. The full-width at half-maximum of the X-ray diffraction rocking curve for (002) reflection was approximately 270 arcsec for Ga face and 80 arcsec for N face.
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