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Control the growth direction of carbon nanofibers under direct current bias voltage applied microwaveplasma enhanced chemical vapor deposition system

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주제분류재료공학

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Abstract

Carbon nanofibers were formed on silicon substrate which was applied by negative direct current (DC) bias voltage using microwave plasma-enhanced chemical vapor deposition method. Formation of carbon nanofibers were varied according to the variation of the applied bias voltage. At −250 V, we found that the growth direction of carbon nanofibers followed the applied direction of the bias voltage. Based on these results, we suggest one of the possible techniques to control the growth direction of the carbon nanofibers.

참고문헌 (9)

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  6. "“Plasmainducedalignment of carbon nanotubes”" (2000)
  7. "“Growth of aligned carbonnanotubes by biasing during growth”" (2001)
  8. "“Lateralgrowth of aligned multiwalled carbon nanotubes underelectric field”" (2003)
  9. "“Growth orientation of carbon nanotubesby thermal vapor deposition”" (2002)

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